- 4.1.1 Maxwell's Equations
- 4.1.2 Transport Equations and Mobility
- 4.1.3 Current Density
- 4.1.4 Basic MOS Equations

4.1 Semiconductor Device Equations

Here, denotes the magnetic field and the magnetic flux density vector, while corresponds to the electric field and to the electric displacement vector. They are related through the equations

(4.1) | |

(4.2) |

where the and denote the relative magnetic permeability and the relative dielectric permittivity of the medium, respectively.

The wavelength associated with an operating frequency of say, GHz, is given by

(4.3) |

Since is much greater than the typical device dimensions, which are of the order of , a quasi-stationary condition can be assumed for the electric field which can be expressed as a gradient of a scalar potential field,

Using (4.1) and (4.4) and Gauss's Law of Electrostatics, we obtain Poisson's equation,

The space charge density in semiconductors comprises of the mobile charges and the fixed charges. Electrons and holes contribute to the mobile charges while fixed charges are the ionized donors and acceptors,

The and denote the electron and hole concentrations and corresponds to the net doping concentration.

Taking the divergence of Ampere's Circuital Law gives

The current density in semiconductors is the sum of the electron and hole current densities denoted by and .

Considering the fixed charges to be time-invariant , we get

The quantity gives the net recombination rate for electrons and holes. A positive value means recombination, a negative value generation of carriers. Equations (4.9) and (4.10) are collectively known as the carrier continuity equations.

4.1.2 Transport Equations and Mobility

Here denotes the single particle distribution function, denotes the group velocity of electrons and is the applied electric field. The left hand term in (4.11) describes the evolution of the distribution function with time in the six dimensional phase space of coordinates and in the presence of externally applied forces. The right hand side term corresponds to the effect of various scattering mechanisms on the distribution function.

Electrons and holes are accelerated by the electric field, but lose momentum as a result of various scattering processes. These scattering mechanisms contributing to the collision term in (4.11) are due to lattice vibrations (phonons), impurity ions, other carriers, surfaces, and other material imperfections. Fig. 4.1 shows a chart describing the various mechanisms of carrier scattering in a semiconductor. The effects of all of these microscopic phenomena are lumped into the macroscopic mobility introduced by the transport equation. However, in its original form, the BTE does not yield a closed form solution for mobility, and only after making certain assumptions, such as the relaxation time approximation, can the solutions be worked out. The resulting mobility can be expressed as

where denotes the average momentum relaxation time and is the effective mass tensor. The mobility expression in (4.12) is popularly referred to as the Drude model [Drude00]. It is apparent that the value of directly affects the value of the mobility, and thus characterization of scattering mechanisms helps in estimating the mobility. For Si and Ge, the effective mass tensor is diagonal with equal diagonal components and therefore the mobility can be expressed as a scalar, .

In an actual sample of Si, multiple mechanisms can act to scatter the motion of electrons. Based on the assumption of the statistical independence of the scattering mechanisms, the scattering rates may be added using Matthiessen's rule [Nishida87]

(4.13) |

where independent scattering mechanisms are involved. The overall mobility is therefore given by

(4.14) |

Making use of the relaxation time approximation (RTA), the collision term on the RHS of (4.11) can be replaced by

where denotes the equilibrium distribution function. Assuming steady state conditions, the one-dimensional BTE can now be written as

Multiplying (4.16) with and integrating over the three-dimensional velocity space gives

Since the equilibrium function is symmetric, the first integral on the RHS in (4.17) vanishes, and the RHS of (4.17) becomes

and therefore, we have,

Evaluating the integrals in (4.19),

(4.20) | |

(4.21) |

Introducing the mobility as in (4.12) and the average value as , the current density in (4.19) becomes

A similar equation is obtained for the hole current density.

The Poisson equation (4.5) together with the continuity equations (4.9) and (4.10) and the current density relations (4.22) and (4.23) constitute the fundamental equations for performing drift diffusion based simulations.

Here, , with as the carrier mobility and as the device width and as the gate length. In the linear regime, where

(4.25) |

the drain current expression can be simplified to

In the saturation regime, where

(4.27) |

the drain current is modeled as

where denotes the channel length modulation parameter. The quantity denotes the threshold voltage and is obtained as

(4.29) |

Here is the flat band voltage

(4.30) |

and is the body-effect coefficient defined as

The potential is evaluated as

In (4.31), is the permittivity of the Si substrate, the acceptor doping concentration, and the capacitance per unit area of the oxide. The denotes the intrinsic carrier concentration of Si, cm at 300 K.

From equations (4.26) and (4.28) it is seen that the drain current is directly proportional to the mobility . Therefore, employment of strained Si, which enhances the mobility, results in an increase in the drain current, thereby making circuits faster. Moreover, since strain causes a relative shift of the conduction and valence band minima, it can result in a reduced threshold voltage due to a decreased work function difference .

S. Dhar: Analytical Mobility Modeling for Strained Silicon-Based Devices